Abstract
The semiconductor manufacturing industry requires highly precise and reliable control systems to produce devices with extremely small features. As the industry moves towards smaller nodes and more complex processes, the demands for precision in both positioning, temperature control, and material handling have reached unprecedented levels. This paper explores the development and application of high-precision control systems in semiconductor manufacturing. It examines the challenges associated with ensuring accuracy in operations such as photolithography, etching, and deposition, highlighting the integration of advanced feedback control, real-time data processing, and sensor technology. Furthermore, the paper discusses recent innovations in adaptive control, machine learning, and advanced sensor fusion that improve performance in semiconductor fabrication. The importance of these systems in maintaining yield, reducing defects, and increasing throughput is emphasized, along with the future research directions aimed at achieving even greater precision in semiconductor production.
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